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Molecular Architecture |
End-group (Z) |
MW |
Surface tension + mN/m or dmy/cm2 |
Polyether type |
Solubility++ in Hexane |
Typical applications in various types of coatings and inks +++ |
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Water-borne |
Solvent-based and high solids |
Radiation cure UV/EB |
Powder Coating |
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CoatOSil* products: |
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Water-borne |
Solvent-based and high solids |
Radiation cure UV/EB |
Powder Coating |
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(1) CoatOSil 1211C |
N/A |
N/A |
N/A |
20.5 |
N/A |
SSD |
F/L substrate wetting, air release |
Wetting, F/L substrate wetting, air release |
Wetting, F/L, substrate wetting, air release |
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CoatOSil 2812 |
Linear |
H |
2000 |
26.6 |
All-EO |
SII |
Slip, mar resist, COF reduction; defoaming |
Defoaming, COF reduction, slip, mar resistance |
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CoatOSil 2816 |
Linear |
Me |
3,000 |
29.6 |
EO/PO |
SDD |
Slip, mar resist |
F/L |
F/L |
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CoatOSil 3500 |
Linear |
H |
2100 |
25.4 |
All-EO |
III |
F/L, slip |
Substrate wetting, defoaming, F/L, gloss |
F/L, COF reduction, slip, mar resistance |
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CoatOSil 3501 |
Pendant |
H |
8000 |
Insoluble |
All-EO |
SSD |
Defoaming, antiblocking, COF reduction |
Defoaming, antiblocking, COF reduction |
Defoaming, COF reduction, slip, mar resistance |
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CoatOSil 3505 |
Linear |
H |
2800 |
Insoluble |
All-PO |
SSS |
Defoaming, slip |
F/L, slip, mar resist, gloss retention, defoaming |
COF reduction, mar resistance, slip |
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CoatOSil 3573 |
Pendant |
Me |
10,000 |
Insoluble |
All-EO |
SSI |
Defoaming, antiblocking, slip |
Defoaming, antiblocking, slip, COF reduction |
Defoaming, COF reduction, slip, mar resistance |
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CoatOSil 7001/ (2) CoatOSil 7001E |
Pendant |
Me |
20,000 |
28.2 |
EO/PO |
III |
F/L, substrate wetting, air release |
Wetting, F/L |
F/L, substrate wetting |
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CoatOSil 7033 |
Pendant |
Me |
20,000 |
31.0 |
EO/PO |
III |
F/L, substrate wetting, air release |
F/L, substrate wetting |
F/L |
F/L, gloss |
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CoatOSil 7200 |
Pendant |
H |
19,000 |
34.2 |
EO/PO |
III |
F/L, wetting |
F/L |
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CoatOSil 7210 |
Pendant |
H |
13,000 |
30.3 |
EO/PO |
III |
Defoaming, slip |
F/L |
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CoatOSil 7220 |
Pendant |
H |
17,000 |
26.8 |
EO/PO |
SSS |
Defoaming |
F/L, gloss |
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CoatOSil 7230 |
Pendant |
H |
29,000 |
32.4 |
EO/PO |
III |
Defoaming |
F/L |
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CoatOSil 7500 |
Pendant |
Bu |
3000 |
Insoluble |
All-PO |
SSS |
Defoaming |
F/L, wetting, gloss |
F/L, gloss |
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CoatOSil 7510 |
Pendant |
H |
13,000 |
Insoluble |
All-PO |
SSS |
Defoaming |
F/L, defoaming |
Defoaming |
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CoatOSil 7550 |
Trisiloxane |
H |
400 |
Insoluble |
All-EO |
SSS |
Defoaming |
Air release, wetting |
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CoatOSil 7600 |
Pendant |
Me |
4000 |
25.1 |
All-EO |
III |
F/L |
F/L |
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CoatOSil 7602 |
Pendant |
Me |
3000 |
26.6 |
All-EO |
SII |
Slip, mar resist, F/L, antiblocking |
Slip, COF reduction, mar resistance |
F/L, COF reduction, slip, mar resistance |
F/L, gloss |
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CoatOSil 7604B |
Pendant |
H |
4000 |
25.4 |
All-EO |
III |
F/L, wetting |
F/L |
F/L |
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CoatOSil 7605 |
Pendant |
Me |
6000 |
30.2 |
All-EO |
III |
F/L, wetting, gloss |
F/L, gloss |
F/L |
F/L, gloss |
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CoatOSil 7607 |
Pendant |
Me |
1000 |
23.4 |
All-EO |
SII |
Substrate wetting, F/L, wetting |
Wetting, substrate wetting |
F/L, wetting |
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CoatOSil 7608 |
Trisiloxane |
H |
600 |
21.4 |
All-EO |
III |
F/L, gloss, air release |
Air release, wetting, F/L, gloss |
F/L, gloss, wetting, air release |
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CoatOSil 7650 |
Pendant |
H |
3000 |
23.2 |
All-EO |
III |
Slip, mar resist |
F/L |
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CoatOSil 77 |
Trisiloxane |
Me |
600 |
20.5 |
All-EO |
SSS |
Air release, wetting, substrate wetting F/L |
Wetting, substrate wetting, F/L, air release |
F/L, substrate wetting, air release |
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Epoxy reactives: |
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CoatOSil MP200 |
N/A |
Epoxy/Methoxy |
N/A |
Insoluble |
No polyether |
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Adhesion promoter & crosslinker |
Adhesion promoter & crosslinker |
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Adhesion promoter & crosslinker |
애경케미칼 가소제 NEO-T(DOTP)
